New, improved Zap&Hide® Blemish Concealer pleasantly and effectively zaps your blemishes and hides them too!
Zap is a clear stick containing beneficial antiseptic and anti-inflammatory botanicals, while Hide is a highly pigmented, creamy concealer to cover the blemish. Zap&Hide is powerful and effective, but gentle enough to be used as often as needed. Keep your skin looking fresh and clean all day long!
Features and benefits:
Blemish Balm: Butyrospermum Parkii (Shea Butter), Isopropyl Jojobate, Euphorbia Cerifera (Candelilla) Wax, Persea Gratissima (Avocado) Oil, Tetrahexyldecyl Ascorbate, Copernicia Cerifera (Carnauba) Wax, Polygonum Fagopyrum (Buckwheat) Seed Extract, Algae Extract, Saccharum Officinarum (Sugar Cane) Extract, Melaleuca Alternifolia (Tea Tree) Leaf Oil, Lavandula Angustifolia (Lavender) Oil, Geranium Maculatum Oil, Cananga Odorata (Ylang Ylang) Flower Oil, Commiphora Myrrha (Myrrh) Oil.
Blemish Concealer: Aqua/Water/Eau, Dimethicone, Dimethicone/Polyglycerin-3 Crosspolymer, Glycerin, Helianthus Annuus (Sunflower) Seed Oil, Jojoba Esters, Persea Gratissima (Avocado) Oil, Cera Alba (Beeswax), Psoralea Corylifolia Extract, Coconut Alkanes (and) Polysilicone 11, Squalane, Raphanus Sativus (Radish) Root Extract Alaria Esculenta (Algae) Extract, Polymethylsilsesquioxane, Rubus Idaeus (Raspberry) Seed Oil, Melaleuca Alternifolia (Tea Tree) Leaf Oil, Lavandula Angustifolia (Lavender) Oil, Anthemis Nobilis (Chamomile) Flower Oil, Camellia Sinensis (Green Tea) Leaf Oil, Tocopherol, Lonicera Caprifolium (Honeysuckle) Flower Extract (and) Lonicera Japonica (Honeysuckle) Flower Extract. May Contain: Titanium Dioxide (CI 77891), Boron Nitride, Iron Oxides (CI 77489, CI 77491, CI 77492, CI 77499).
© 2012 Iredale Mineral Cosmetics, Ltd
Use the blemish balm alone as a nighttime treatment and under the concealer for day
Cleanse the area to be covered. Apply Blemish Balm, the clear side, to the blemish. Then, apply Blemish Concealer and feather the edges with finger or Camouflage Brush. Follow with Amazing Base or PurePressed Base.